Lub hauv paus ntsiab lus ntawm far uvc 222 172nm UV LED electron beam evaporation ion beam thiab magnetron sputtering ion beam
9.3 Arc Electron Flow
Nyob rau hauv xyoo tas los no, lub siab - zog, siab - ntom arc electron ntws hauv arc tawm tau ua lub luag haujlwm tseem ceeb hauv cov txheej txheem ion plating, xws li cua sov workpieces, ntxuav workpieces, txhim kho cov teebmeem ionization, thiab txheej txheej. Cov yam ntxwv no tau qhia hauv tshooj dhau los. Tshooj lus no piav qhia thiab npaj cov yam ntxwv, tiam neeg txoj kev, thiab kev siv ntawm arc electron flow, tso cai rau cov neeg nyeem kom txaus siab rau qhov tseem ceeb ntawm kev siv tag nrho arc electron flow.
9.3.1 Yam ntxwv thiab tiam txheej txheem ntawm Arc Electron Flow
1. Cov yam ntxwv ntawm Arc Electron Flow
Qhov ceev ntawm electron flow, ion flow, thiab siab -lub zog nruab nrab atoms nyob rau hauv arc plasma generated los ntawm arc tawm yog ntau dua li nyob rau hauv glow tawm. Hauv qhov chaw txheej txheej, muaj cov roj ions ntau dua, cov hlau ions, zoo siab heev - lub zog atoms, thiab ntau pawg ua haujlwm, uas ua lub luag haujlwm tseem ceeb hauv cov cua sov, tu, thiab txheej txheej txheej txheej txheej txheej. Daim ntawv txiav txim ntawm arc electron ntws txawv ntawm ion beams; nws tsis yog tag nrho converged rau hauv "beam" tab sis feem ntau nyob rau hauv ib lub xeev divergent, li no nws yog hu ua arc electron flow. Txij li thaum arc electron ntws txav mus rau lub anode, qhov twg qhov zoo ncej ntawm arc fais fab mov txuas nrog, lub arc electron flow yuav raug coj mus rau ntawd. Lub anode tuaj yeem yog cov khoom ua haujlwm, pab pawg anode, crucible, thiab lwm yam.
2. Cov txheej txheem tsim cov Arc Electron Flow
(1) Gas Source Generation of Arc Electron Flow
Hollow cathode arc tawm thiab kub filament arc tawm tuaj yeem ua tiav qhov hluav taws xob ntawm ib ncig ntawm 200A, nrog rau qhov hluav taws xob ntawm 50 ~ 70V.
(2) Cov khoom tsim los ntawm Arc Electron Flow
Cathodic arc qhov chaw, suav nrog cov chaw me me, cov khoom siv columnar arc, cov duab plaub qhov loj arc qhov chaw, thiab lwm yam. Txhua cathodic arc qhov paug tawm muaj qhov arc tam sim no ntawm 80 ~ 200A thiab arc voltage ntawm 18 ~ 25V. Qhov siab- ntom, qis-zog arc electron ntws hauv ob hom arc tso ntshav tuaj yeem tsim kev sib tsoo ionization nrog roj thiab hlau txheej atoms, yielding ntau cov pa roj ions, hlau ions, ntau yam siab -lub zog active atoms, thiab active pab pawg, yog li ua kom cov kev ua si tag nrho.
9.3.2 Daim ntawv thov ntawm Arc Electron Flow
1. Kev siv roj av Arc Electron Flow
1) Lub Tuam Txhab Balzers Tsim Cov Kub Filament Arc Ion Plating Tshuab Ua ntej
Lub arc electron ntws tawm los ntawm kub filament arc phom los ntawm sab saum toj mus rau hauv qab mus rau lub anode tuaj yeem tswj tau tag nrho cov txheej txheem ntawm cua sov, ntxuav, thiab txheej txheej ntawm lub workpiece los ntawm kev hloov cov anode txoj hauj lwm thiab electromagnetic tam sim no variations. Txawm hais tias lub tshuab plating no tsis siv rau txheej, nws tseem ua haujlwm rau kev ua haujlwm cua sov thiab foob pob tawg.
2) Lub Tuam Txhab Hauzer Hloov Txoj Haujlwm Anode
Siv cov teebmeem hluav taws xob nkaus xwb, lub arc electron ntws ionizes argon roj thaum lub sij hawm txav mus rau lub anode los ua siab - ntom ntom argon ion txaus rau bombardment tu ntawm workpieces; ionizing nitrogen gas ua rau siab - ceev nitrogen ion txaus rau arc ion nitriding.
3) Thaum pib, Hollow Cathode Phom tsuas yog siv hauv Hollow Cathode Ion Plating Machine
Dalian Jingjing Technology Co., Ltd. tau teeb tsa lub phom cathode hauv qhov me me arc qhov chaw ion plating tshuab ua lub foob pob ntxuav rau cov khoom ua haujlwm, ua tiav cov txiaj ntsig zoo tu thiab txhim kho workpiece nto brightness.
4) Dr. Peng Hongjian tau nruab ib rab phom Hollow Cathode nyob rau hauv ib qho me me Arc Source Ion Plating Tshuab
Thaum txheej txheej nrog qhov me me arc, rab phom hollow cathode tau qhib ib txhij, siv high -density arc electron flow los ua kom muaj kev sib tsoo nrog cov txheej txheej, ua kom cov txheej txheem txheej. Daim duab 9-10 Atomic force microscope images of coating structure refined by hollow cathode arc electron flow a) Hollow cathode gun tam sim no 0A b) Hollow cathode gun tam sim no 120A c) Hollow cathode gun tam sim no 140A d) Hollow cathode gun current 160A Figure: Dr. Raws li pom nyob rau hauv daim duab 9-10, nrog nce hollow cathode arc tam sim no, loj hais nyob rau hauv lub txheej maj mam txo thiab refine, qhia tau hais tias high-density arc electron txaus yuav refine tus qauv ntawm coatings los ntawm cathodic arc qhov chaw.
2. Kev siv cov khoom siv Arc Electron Flow
(1) Arc Electron Flow Enhanced Workpiece Cleaning Technology
Nyob rau hauv cov txheej txheem ion plating, glow discharge argon ion tu feem ntau yog siv rau workpieces, tab sis lub argon ion txaus ceev ntawm glow paug yog tsawg; siv titanium ions los ntawm cathodic arc qhov chaw plasma los ntxuav workpieces tuaj yeem tsim cov khoom loj ntawm qhov chaw. Lub tshuab tshiab tau tshwm sim siv hluav taws xob ntws los ntawm qhov chaw txias-induced arc plasma emitted los ntawm cathodic arc qhov chaw los ionize argon roj, ua kom tsawg - zog, siab - ntom argon ions rau workpiece tu. Ntau yam cathode- anode txoj hauj lwm sib tw tso cai rau hluav taws xob los tsav hluav taws xob ntws mus rau txhua txoj haujlwm anode uas xav tau. Bombardment tu nrog qis-zog, siab- ntom ntom argon ion txaus muab cov txiaj ntsig zoo tu thiab ua haujlwm siab qhov ci ntsa iab. Qhov no yog qhov yooj yim tshaj plaws thiab qis tshaj -tus nqi txoj hauv kev kom tau txais siab - ntom ntom argon ion ntws.
(2) Arc Electron Flow Enhanced Magnetron Sputtering Txheej txheej txheem
Magnetron sputtering txheej thev naus laus zis ua haujlwm nyob rau hauv glow discharge nrog tsawg plasma ntom, uas ua rau qis deposition nqi, tsis tshua muaj zaj duab xis - substrate adhesion, tsis tshua muaj hlau ionization tus nqi, thiab tsawg txheej particle zog, ua rau nws nyuaj rau kom tau cov compound films. Nyob rau hauv xyoo tas los no, ib tug tshiab technology tau tshwm sim los ntawm configuring cathodic arc qhov chaw nyob rau hauv magnetron sputtering tshuab los txhim kho qib ntawm magnetron sputtering txheej.
High-density arc electron flow ionizes argon gas to produce high-density argon ion flow for bombardment cleaning workpieces, replace long-siv titanium ion bombardment cleaning and improved decoration effect for high-kawg decorative products coated by magnetron.
High -density arc electron flow ionizes argon gas to produce high-density argon ion flow for target sputtering, nce deposition rates.
Matched cathodic arc qhov chaw nyob rau hauv magnetron sputtering lub hom phiaj txheej tuaj yeem coated nrog magnetron sputtering lub hom phiaj tom qab workpiece tu, ua kom cov yeeb yaj kiab alloy thiab ntau cov yeeb yaj kiab.
Assisted deposition. Thaum lub sij hawm txheej txheej los ntawm cathodic arc qhov chaw, electron ntws tshaj 100A emitted tsub kom ionization tus nqi ntawm sputtered txheej atoms, yooj yim compound zaj duab xis tsim; ntau hlau ions ncav cuag lub workpiece, nce magnetron sputtering deposition nqi. Hauv Tshooj 7, lub columnar cathodic arc ion plating tshuab tsim los ntawm Platt Company tau qhia, nrog rau columnar cathodic arc qhov chaw nruab nrab hauv nruab nrab raws li columnar magnetron sputtering lub hom phiaj (tus qauv m411 qub). Qhov nruab nrab magnetron sputtering phiaj siv ceramic insulating lub hom phiaj, thaum lub qhov rooj columnar arc qhov chaw siv ntau lub hom phiaj. Ob qhov sib txawv columnar txheej txheej txheej txheej ua ke los tsim cov txheej txheem nyuaj. Qhov rooj columnar arc qhov chaw tuaj yeem ntxuav lub hom phiaj cov raj thiab cov khoom ua haujlwm thiab ua cov txheej txheem txheej, muab cov teebmeem hauv qab no thaum lub sijhawm txheej txheej nrog nruab nrab lub hom phiaj:
Emitting siab - ntom electron ntws nce argon ion ceev, nce deposition nqi.
High- ceev electron ntws nce ionization tus nqi ntawm sputtered txheej hais, tsa tus nqi deposition thiab ua tiav 2μm / h rau composite hard coatings.
Ntau dua ionization tus nqi txhim kho kev ua haujlwm ntawm ntau yam txheej txheej, ua kom yooj yim reactive deposition ntawm composite hard coatings. Qhov no yog ib qho piv txwv zoo heev ntawm kev siv cathodic arc qhov chaw -emitted arc electron ntws los txhim kho magnetron sputtering txheej.
a) Electron Beam Evaporation Ion Beam Assisted Deposition
b) Magnetron Sputtering Ion Beam Assisted Deposition
Cov no siv cov khoom siv ion beams. Zaj duab xis atoms sputtered los ntawm lub hom phiaj los ntawm ion beams tso rau hauv lub substrate, thaum lub ion qhov chaw ntawm sab laug irradiates lub workpiece, ua tiav ib txhij sputtering txheej thiab ion beam bombardment. Qhov zoo muaj xws li: sputtered hais muaj zog los ntawm siab -zog ion beam sputtering, muab zoo adhesion rau lub substrate; arbitrary kev sib txuas ntawm hlau thiab tsis yog -cov ntsiab lus hlau tso cai rau ntau hom yeeb yaj kiab; Lub tshuab nqus tsev siab thaum txheej txheej nyiam ua haujlwm zoo heev nyias zaj duab xis.
(3) Cov Txheej Txheem Txheej Txheem Magnetron Sputtering Txheej
Pa magnetron sputtering muaj tsawg hlau ionization tus nqi, ua reactive deposition ntawm compound films nyuaj. Tam sim no, magnetron sputtering lub hom phiaj txheej yog ua ke nrog ion beam pab bombardment los txhim kho txheej zoo, zaj duab xis - substrate adhesion, thiab ionization tus nqi ntawm txheej hais, nce deposition tus nqi thiab yooj yim compound nyias zaj duab xis. Cov thev naus laus zis no tau siv dav hauv tshuab, aerospace, ntaub ntawv, architecture, thiab kho kom zoo nkauj teb. Ntev strip anode txheej ion qhov chaw yog tsim nyog rau loj - cheeb tsam planar khoom txheej. Hauv qee qhov kev siv kho qhov muag, cov cuab yeej pabcuam no tuaj yeem ua ke172nm UV LEDlos yogUVC 222nm qhov chaw teeb pom kev zoo rau saum npoo, ntxiv dag zog rau kev ua yeeb yaj kiab.
(4) Kev siv Ion Beam Assisted Deposition Technology
Ion beam assisted deposition (IBAD) tau ua tiav cov ntaub ntawv tshiab thiab npaj siab -cov yeeb yaj kiab ua tau zoo, nrhiav cov ntawv thov hauv cov yeeb yaj kiab rwb thaiv tsev, cov yeeb yaj kiab tiv thaiv, cov yeeb yaj kiab kho qhov muag, laser iav txheej rau cov khoom siv hluav taws xob, thiab hnav-tiv taus, corrosion- cov yeeb yaj kiab tiv thaiv rau cov cuab yeej, pwm, thiab bearings.
1) Txhim kho zaj duab xis ceev
Qhov ntxov tshaj plaws ntawm ion beam pab deposition yog nyob rau hauv kev ua hauj lwm nyias zaj duab xis rau hluav taws xob, sib nqus, thiab optical zog. Tsawg-cov khoom siv hluav taws xob ion muab kev pab cuam foob pob, tswj cov qauv ntawm zaj duab xis thiab qhov ntom ntom nrog cov kab teeb ion. Daim duab 9-8 qhia tau hais tias ion-pab deposition nce ceev ntawm electron beam evaporation txheej txheem. Cov zaj duab xis siab dua yuav txo qhov porosity, txhim kho adhesion, thiab muab kev puas tsuaj rau laser siab nrog qis optical scattering. Hauv kev sib sib zog nqus ultraviolet optical systems, sib txuasUVC 222nm lub teeb qhov chaw tuaj yeem ua kom zoo dua cov yeeb yaj kiab kev ruaj ntseg ntawm lub wavelengths luv.
2) Tau txais cov yeeb yaj kiab ua haujlwm zoo nrog Stoichiometric Composition
Common optical films yog oxide zaj duab xis xws li [ntau oxides]. Direct evaporation ntawm cov oxides thaum txheej txheej ua rau tsis muaj oxygen, cuam tshuam rau kev ua yeeb yaj kiab kho qhov muag. Oxygen ion beam enhanced deposition compensates oxygen poob thaum lub sij hawm deposition, ua tau zoo - zoo optical films. Rau qee qhov kho qhov muag coatings xav tau huab purity thiab antibacterial zog, pab172nm UV LEDtuaj yeem raug qhia rau kev tua kab mob saum npoo thiab ua kom muaj kab mob, kom muaj kev sib kis -cov yeeb yaj kiab dawb.
3) Tau txais hlau-Doped Pob Zeb Diamond- Zoo li Carbon Films (M-DLC)
Pob zeb diamond-zoo li cov pa roj carbon (DLC) cov yeeb yaj kiab yog dav siv rau kev ua haujlwm siab, hnav tsis kam, thiab corrosion kuj. Tsawg-zog ion beam pab deposition tsim DLC films nrog hardness txog 5100HV. Cov kev sim qhia tau hais tias hlau-doped DLC films npaj los ntawm ion beam pab deposition muaj zaj duab xis zoo heev- substrate adhesion, tsis tshua muaj deg roughness, thiab superior hnav tsis kam.
Ion beam irradiation synchronizes nrog zaj duab xis deposition, siv ion implantation li thiab hloov cov teebmeem thoob plaws hauv cov txheej txheem, txhim kho zaj duab xis -substrate adhesion, qauv morphology, zaj duab xis kev ntxhov siab, ceev, thiab kev hloov txheej txheej thiab cov khoom, yielding superior nyias films. Hauv cov cuab yeej kho mob txheej txheej, cov cuab yeej no ua ke nrogUVC 222nm cov khoom siv tshuaj tua kab mob tuaj yeem txhim kho qhov chaw nrog ob qho tib si hnav thiab tus kheej - tua kab mob ua haujlwm.
